TY - JOUR T1 - Investigation of Pt/Ti bilayer metallization on silicon for ferroelectric thin film integration JO - Journal of Applied Physics PY - 1994/01/01 AU - Sreenivas K AU - Reaney I AU - Maeder T AU - Setter N AU - Jagadish C AU - Elliman RG ED - DO - DOI: 10.1063/1.355889 VL - 75 IS - 1 SP - 232 EP - 239 Y2 - 2025/03/16 ER -