TY - JOUR
T1 - Investigation of Pt/Ti bilayer metallization on silicon for ferroelectric thin film integration
JO - Journal of Applied Physics
PY - 1994/01/01
AU - Sreenivas K
AU - Reaney I
AU - Maeder T
AU - Setter N
AU - Jagadish C
AU - Elliman RG
ED -
DO - DOI: 10.1063/1.355889
VL - 75
IS - 1
SP - 232
EP - 239
Y2 - 2025/03/16
ER -